
Filtering Fringe Patterns 
with the Extended Non Local Means Algorithm 
Maciej Wielgus and Krzysztof Patorski 
Institute of Micromechanics and Photonics, ul. Św. A. Boboli 8, 02-525 Warsaw, Poland 
Keywords:  Fringe Pattern Processing, Image Filtration, Non Local Means. 
Abstract:  The quality of interferometric measurements substantially benefits from the digital noise filtration. 
Recently, robust non local filtration algorithms were introduced to optical metrology, the non local means 
algorithm in particular. These methods allow to take advantage from the information redundancy spread in 
the whole image domain for processing each pixel, constituting a powerful image denoising tool. We 
evaluate how the denoising performance quality of the non local means algorithm can be further increased 
by the introduction of geometrical transformations of the compared patches. 
1 INTRODUCTION 
Uncertainty is an intrinsic feature of every 
measurement, appearing as noise in the measuring 
system output. For fundamental reasons it is 
impossible to fully remove its influence by hardware 
setup modification. Instead of increasing the 
hardware requirements most (if not all) systems for 
interferometric measurements introduce some digital 
noise filtration, applied to the registered pattern 
before further processing. In many cases this is 
a simple down-pass filtration by averaging with 
binary or Gaussian mask. Median filter is a popular 
choice as well. Dozens of more sophisticated 
methods were proposed throughout the years. 
One of the attractive novel developments in 
image processing is the notion of the non local 
filtration such as the non local means algorithm – 
NLM (Buades et al., 2005). This group of methods 
was recognized in the fringe pattern analysis just 
recently. In (Wielgus and Patorski, 2012) basic 
NLM algorithm was tested against several popular 
filtration methods for interferometric pattern 
filtration, while in (Fu and Zhang, 2012) modified 
technique was proposed. The power of non local 
methods lays in their ability of utilizing redundancy 
in the whole image domain rather than in limited 
neighbourhood of the considered pixel. Typically in 
non local processing we compare patches (small 
subimages containing the central pixel and its 
neighbourhood) and average the intensities of their 
central pixels based on established measure of patch 
similarity. Unlike local averaging, the non local 
method enables to avoid oversmoothing the image 
and blurring its delicate features. 
Robustness of non-local filtration for 
photographic images, as shown in (Buades et al., 
2012), could be found as a surprising issue, as these 
images do not represent any visible similarity of 
distant patches. However, as noted in (Wielgus and 
Patorski, 2012), situation is very different with 
fringe patterns, which are quasiperiodic in nature 
and therefore display similarity even between 
significantly distant patches. To illustrate and 
quantitatively evaluate this effect we calculate the 
correlation of the fringe pattern presented in Figure 
1 (a) with its chosen patch, located in the centre of 
the image. This is a fragment of an experimentally 
obtained interferogram of a silicone micromembrane 
(Salbut et al., 2003). In Figure 1 (b) we show the 
map of cross-correlation between the image and the 
selected patch (brighter color = more similarity). 
Note that it is a nonmonotonic function of distance 
from the considered patch and that correlation 
reaches high values even quite far away from the 
chosen patch. This explains why non local methods 
are supposed to fit particularly well for the fringe 
pattern filtration. For the sake of clarity, only pixels 
with normalized correlation larger than 0.3 are 
shown. 
In this paper we intend to exploit another 
property of fringe patterns to further increase the 
redundancy from which non local methods benefit, 
52
Wielgus M. and Patorski K..
Filtering Fringe Patterns with the Extended Non Local Means Algorithm.
DOI: 10.5220/0004339500520055
In Proceedings of the International Conference on Photonics, Optics and Laser Technology (PHOTOPTICS-2013), pages 52-55
ISBN: 978-989-8565-44-0
Copyright
c
 2013 SCITEPRESS (Science and Technology Publications, Lda.)