# BI-OBJECTIVE OPTIMIZATION OF THE PLASMON-ASSISTED LITHOGRAPHY - Design of Plasmonic Nanostructures

### Caroline Prodhon, Demetrio Macías, Farouk Yalaoui, Alexandre Vial, Lionel Amodeo

#### 2009

#### Abstract

We discuss the influence of the objective function within the context of plasmons-assisted lithography. From previous publications, numerical experiments have shown that the maximization by means of an Evolutionary Strategy of either the visibility or the contrast of the plasmons interference pattern related to the problem does not lead to the ideal situation in which both criteria are maximal. The idea is then to tackle simultaneously these two objective-functions. However, as they are strongly dependent, a more promising strategy is to focus on the minimal and maximal near-field scattered intensities involved in both previously studied criteria. We think that an Evolutionary Strategy based on a bi-objective optimization of these new criteria will provide more satisfactory solutions with respect to the physical constraints imposed.

#### References

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#### Paper Citation

#### in Harvard Style

Prodhon C., Macías D., Yalaoui F., Vial A. and Amodeo L. (2009). **BI-OBJECTIVE OPTIMIZATION OF THE PLASMON-ASSISTED LITHOGRAPHY - Design of Plasmonic Nanostructures** . In *Proceedings of the International Joint Conference on Computational Intelligence - Volume 1: ICEC, (IJCCI 2009)* ISBN 978-989-674-014-6, pages 306-309. DOI: 10.5220/0002322403060309

#### in Bibtex Style

@conference{icec09,

author={Caroline Prodhon and Demetrio Macías and Farouk Yalaoui and Alexandre Vial and Lionel Amodeo},

title={BI-OBJECTIVE OPTIMIZATION OF THE PLASMON-ASSISTED LITHOGRAPHY - Design of Plasmonic Nanostructures},

booktitle={Proceedings of the International Joint Conference on Computational Intelligence - Volume 1: ICEC, (IJCCI 2009)},

year={2009},

pages={306-309},

publisher={SciTePress},

organization={INSTICC},

doi={10.5220/0002322403060309},

isbn={978-989-674-014-6},

}

#### in EndNote Style

TY - CONF

JO - Proceedings of the International Joint Conference on Computational Intelligence - Volume 1: ICEC, (IJCCI 2009)

TI - BI-OBJECTIVE OPTIMIZATION OF THE PLASMON-ASSISTED LITHOGRAPHY - Design of Plasmonic Nanostructures

SN - 978-989-674-014-6

AU - Prodhon C.

AU - Macías D.

AU - Yalaoui F.

AU - Vial A.

AU - Amodeo L.

PY - 2009

SP - 306

EP - 309

DO - 10.5220/0002322403060309