Authors:
Andrei Ushkov
1
;
2
;
Olivier Dellea
3
;
Isabelle Verrier
2
;
Thomas Kampfe
2
;
Alexey Shcherbakov
4
;
Jean-Yves Michalon
2
and
Yves Jourlin
2
Affiliations:
1
Center for Photonics and 2D Materials, Moscow Institute of Physics and Technology, 9 Institutsky Lane, Dolgoprudny 141700, Russia
;
2
Univ. Lyon, UJM-Saint-Etienne, CNRS, Institut d’Optique Graduate School, Laboratoire Hubert Curien UMR 5516, F-42023 Saint-Etienne, France
;
3
Grenoble Alpes Univ., CEA-Liten, 17 rue des Martyrs, 38054 Grenoble, France
;
4
Department of Physics and Engineering, ITMO University, 49 Kronverksky Pr., 197101 St. Petersburg, Russia
Keyword(s):
Nanosphere Photolithohraphy, NPL, Extraordinary Optical Transmission, EOT, Disorder, Nanopore Array, Diffraction Graing, Plasmonics, Numerical Simulations.
Abstract:
We analyze both experimentally and numerically the influence of nanopore arrays disorder on extraordinary optical transmission in samples, fabricated via nanosphere photolithography. Two measures of disorder are considered, the correlations between them are discussed using experimental and numerical data. We propose a theoretical model which takes explicitly the disorder into account, and show how the concurrence between nanopore depth and disorder level defines the quality of EOT excitation. Simulated spectra are in a good agreement with experimental ones. Our results reveal the possibilities of NPL for EOT-based applications and pave the way toward plasmonic devices with a polycrystalline design.