Authors:
Min Liu
1
;
Li Lin
1
;
Haiyang Jin
1
;
Zhuo Huang
1
;
Liangyuan Zhao
1
;
Xiaohuan Cao
1
;
Caixiang Zhang
2
and
Xiaoping Liao
2
Affiliations:
1
Basin Water Environmental Research Department, Yangtze River Scientific Research Institute, Wuhan, Key Lab of Basin Water Resource and Eco-environmental Science in Hubei Province, Yangtze River Scientific Research Institute and Wuhan, China
;
2
State Key Laboratory of Biogeology and Environmental Geology, China University of Geosciences and Wuhan, China
Keyword(s):
Photolysis behaviour, photolysis rate, nonylphenol isomer, identified products, pathway
Abstract:
To better understand the photolysis behavior of technical nonylphenol (tNP) under low-pressure mercury lamp (20 W) with light source (λ=253.7 nm), the study of the photolysis of single nonylphenol isomer (NP38) and tNP were carried out. The result showed that NP38 and tNP were removed quickly, the photolysis rate of tNP was higher than that of NP38. H2O2 accelerated remarkably the degradation of NP38. Identified products of photolysis of NP38 were probably 4 (2,6-dimethyl-2-heptyl)-1,2-benzenediol or 2 (2,6-dimethyl-2-heptyl)-1,5-benzenediol, The photolysis of NP38 seemed to proceed through two pathway: 4 (2,6-dimethyl-2-heptyl)-1,2-benzenediol was generated by the reaction of NP38 and O2· radicals, the reaction of NP38 and ·OH radicals that produced by the photolysis of H2O maybe the precursor of 2 (2,6-dimethyl-2-heptyl) -1, 5-benzenediol, but the H2O2 oxidised the intermediate products could not be detected by GC-MS.