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Authors: Chun-Han Chou 1 ; Yu-Hsuan Lin 1 ; Hsin-Yi Tsai 1 ; Ray-Ching Hong 1 and Yi-Yung Chen 2

Affiliations: 1 National Applied Research Laboratories, Taiwan Instrument Research Institute, 20 R&D Rd. VI, Hsinchu Science Park, Hsinchu City 30076, Taiwan ; 2 Graduate Institute of Color & Illumination Technology, National Taiwan University of Science and Technology, No.43, Keelung Rd., Sec.4, Da’an Dist., Taipei City 10607, Taiwan

Keyword(s): Lithography, Irradiance Measurement, Uniformity, REMA Lens System, UV LEDs.

Abstract: We have presented the optical system design of control uniformity illumination system for stepper lithography. The illumination system acted a key factor in the lithography, because the output light source quality affected the exposure resolution and yield rate of products. The illumination system was composed by seven lens, imaging field was 12.6mm, chief ray angle was less than 0.4 degrees, distortion was less than 0.47% and numerical aperture was 0.1644. the irradiance flux of target area average was about 20 mW/cm2. The system’s uniformity deviation was less than ± 3 percentages. Each UV-LED of illumination system was individually controlled. It could make the imaging plane always have high uniformity to overcome the problem of light source attenuation.

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Paper citation in several formats:
Chou, C.; Lin, Y.; Tsai, H.; Hong, R. and Chen, Y. (2021). High Uniformity Design of UV LED Illuminators for Exposure Equipment. In Proceedings of the 9th International Conference on Photonics, Optics and Laser Technology - PHOTOPTICS; ISBN 978-989-758-492-3; ISSN 2184-4364, SciTePress, pages 68-72. DOI: 10.5220/0010222300680072

@conference{photoptics21,
author={Chun{-}Han Chou. and Yu{-}Hsuan Lin. and Hsin{-}Yi Tsai. and Ray{-}Ching Hong. and Yi{-}Yung Chen.},
title={High Uniformity Design of UV LED Illuminators for Exposure Equipment},
booktitle={Proceedings of the 9th International Conference on Photonics, Optics and Laser Technology - PHOTOPTICS},
year={2021},
pages={68-72},
publisher={SciTePress},
organization={INSTICC},
doi={10.5220/0010222300680072},
isbn={978-989-758-492-3},
issn={2184-4364},
}

TY - CONF

JO - Proceedings of the 9th International Conference on Photonics, Optics and Laser Technology - PHOTOPTICS
TI - High Uniformity Design of UV LED Illuminators for Exposure Equipment
SN - 978-989-758-492-3
IS - 2184-4364
AU - Chou, C.
AU - Lin, Y.
AU - Tsai, H.
AU - Hong, R.
AU - Chen, Y.
PY - 2021
SP - 68
EP - 72
DO - 10.5220/0010222300680072
PB - SciTePress

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