Spectral Selective High Emissivity Pattern for Applications in near Infrared

Enrique Carretero, Rafael Alonso, Cristina Pelayo

Abstract

In this work, we develop some high emissivity patterns for the near infrared range, between 1200 and 2500nm. These patterns were made by means of the magnetron sputtering technique, and they achieve their functionality by using the optical interference phenomenon so that their superficial reflectance is diminished. This is how we manage to produce surfaces that have a very low reflectance and high spectral emissivity in the abovementioned range. Such patterns can be used for the calibration of temperaturemeasuring systems based on photodiodes detecting near infrared radiation.

References

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Paper Citation


in Harvard Style

Carretero E., Alonso R. and Pelayo C. (2017). Spectral Selective High Emissivity Pattern for Applications in near Infrared . In Proceedings of the 5th International Conference on Photonics, Optics and Laser Technology - Volume 1: PHOTOPTICS, ISBN 978-989-758-223-3, pages 260-264. DOI: 10.5220/0006167102600264


in Bibtex Style

@conference{photoptics17,
author={Enrique Carretero and Rafael Alonso and Cristina Pelayo},
title={Spectral Selective High Emissivity Pattern for Applications in near Infrared},
booktitle={Proceedings of the 5th International Conference on Photonics, Optics and Laser Technology - Volume 1: PHOTOPTICS,},
year={2017},
pages={260-264},
publisher={SciTePress},
organization={INSTICC},
doi={10.5220/0006167102600264},
isbn={978-989-758-223-3},
}


in EndNote Style

TY - CONF
JO - Proceedings of the 5th International Conference on Photonics, Optics and Laser Technology - Volume 1: PHOTOPTICS,
TI - Spectral Selective High Emissivity Pattern for Applications in near Infrared
SN - 978-989-758-223-3
AU - Carretero E.
AU - Alonso R.
AU - Pelayo C.
PY - 2017
SP - 260
EP - 264
DO - 10.5220/0006167102600264